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Иш: Effects of cascade mixing, sputtering and diffusion by high dose light ion irradiation of boron nitride

  1. THE STOPPING AND RANGE OF IONS IN SOLIDS

    J. F. Ziegler

    Боб198815 иқтибос
    ABI

  2. The Stopping and Range of Ions in Matter

    James F. Ziegler, J.P. Biersack

    Боб198510 иқтибос
    ABI

  3. Computer simulation of two-component target sputtering

    W. Eckstein, J.P. Biersack

    Мақола19854 иқтибос
    ABI

  4. Computer simulation of SiC and B4C sputtering by Ar+ and He+ ions bombardment

    T.S. Pugacheva, F.G. Jurabekova, Y. Miyagawa +1

    МақолаIon-surface interactions and analysisNuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms19973 иқтибос
    ABI

  5. Tridyn-binary collision simulation of atomic collisions and dynamic composition changes in solids

    W. Möller, W. Eckstein, J.P. Biersack

    Мақола19883 иқтибос
    ABI

  6. A Modified Stopping Power Formula of Firsov

    Haruo Sugiyama

    Мақола19772 иқтибос
    ABI

  7. Computer simulation of dose effects on composition profiles under ion implantation

    Y. Miyagawa, M. Ikeyama, Kazuki Saito +2

    Мақола19912 иқтибос
    ABI

  8. Dynamic behavior of implanted nitrogen in zirconium at various stages of implantations

    Y. Miyagawa, Yousuke Sakai, M. Ikeyama +3

    Мақола19942 иқтибос
    ABI

  9. The radiation stimulated diffusion role in high dose, low energy, high temperature ion implantation

    S.H. Valiev, T.S. Pugacheva, F.G. Jurabekova +2

    МақолаSilicon and Solar Cell TechnologiesNuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms19971 иқтибос
    ABI