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Иш: Dynamic-sasamal: simulation software for high-dose ion implantation
Molecular dynamics study of sputtering of Cu (111) under Ar ion bombardment
G. Betz, R. Kirchner, W. Husinsky +2
Мақола19943 иқтибосABIComputer simulation of dose effects on composition profiles under ion implantation
Y. Miyagawa, M. Ikeyama, Kazuki Saito +2
Мақола19912 иқтибосABI