Ушбу иш иқтибос қилган ишлар

54 та иш

Иш: Tunable defect engineering in TiON thin films by multi-step sputtering processes: from a Schottky diode to resistive switching memory

1. Nanoionics-based resistive switching memories

   Rainer Waser, Masakazu Aono

   Мақола20075 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.117990

2. Band alignment of rutile and anatase TiO2

   David O. Scanlon, Charles W. Dunnill, John Buckeridge +12

   Мақола20135 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.180614

3. Resistive switching memory effect of ZrO2 films with Zr+ implanted

   Qi Liu, Weihua Guan, Shibing Long +3

   Мақола20082 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.042951

4. A Low‐Temperature‐Grown Oxide Diode as a New Switch Element for High‐Density, Nonvolatile Memories

   Myoung‐Jae Lee, Sunae Seo, D.‐C. Kim +11

   Мақола20062 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.043058

5. High Uniformity of Resistive Switching Characteristics in a Cr/ZnO/Pt Device

   Wen-Yuan Chang, Hsin-Wei Huang, Wei‐Ting Wang +3

   Мақола20122 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.043076

6. The effect of oxygen vacancy on switching mechanism of ZnO resistive switching memory

   Cong Hu, Qi Wang, Shuai Bai +4

   Мақола20172 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.043386

7. A detailed understanding of the electronic bipolar resistance switching behavior in Pt/TiO₂/Pt structure

   Kyung Min Kim, Byung Joon Choi, Min Hwan Lee +6

   Мақола20112 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.106081

8. HfO<sub>2</sub>-Based RRAM: Electrode Effects, Ti/HfO<sub>2</sub> Interface, Charge Injection, and Oxygen (O) Defects Diffusion Through Experiment and <italic>Ab Initio</italic> Calculations

   Boubacar Traoré, P. Blaise, Elisa Vianello +3

   Мақола20152 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.117996

9. Fabrication and photoresponse of a pn-heterojunction diode composed of transparent oxide semiconductors, p-NiO and n-ZnO

   Hiromichi Ohta, Masahiro Hirano, Ken Nakahara +5

   Мақола20032 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.192863

10. Electrical Defects in Silicon Introduced by Sputtering and Sputter‐Etching

    Erik Grusell, S. Berg, L.P. Andersson

    Мақола19802 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192879

11. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192852

12. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192853

13. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192854

14. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192855

15. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192856

16. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192857

17. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192858

18. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192859

19. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192860

20. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192861

21. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192862

22. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192864

23. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192865

24. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192866

25. Сарлавҳасиз

    Бошқа1 иқтибос

    ABIABI:AkademIndex/openalex/2026.other.192867