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Иш: STUDY OF THE DISTRIBUTION PROFILE OF ION- IMPLANTED IN SILICON AND INFLUENCE THERMAL ANNEALING ON THE STRUCTYRE OF IRON SILICIDES

1. Resolving surface chemical states in XPS analysis of first row transition metals, oxides and hydroxides: Cr, Mn, Fe, Co and Ni

   Mark C. Biesinger, Brad P. Payne, Andrew P. Grosvenor +3

   Мақола20109 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.026454