Assessment of the Thickness of the Anti-Reflective Film of a Solar Cell by Color
V. G. DyskinResearch Institute of Semiconductor Physics and Microelectronics, National University of Uzbekistan, 100057, Tashkent, UzbekistanI. A. YuldoshevTashkent State Technical University, 100095, Tashkent, UzbekistanU. B. KhamdamovTashkent State Technical University, 100095, Tashkent, Uzbekistan
ABI
Аннотация
A method for estimating film thickness based on the color painting of the non-absorbing film-absorbing substrate system is proposed. The method can be useful for developing the technology of applying anti-reflective coatings to solar cells. The thickness of a dark blue anti-reflective SiO film applied to a silicon wafer was determined to illustrate the method.
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