Unraveling the photoelectrochemical behavior of Ni-modified ZnO and TiO2 thin films fabricated by RF magnetron sputtering
Mirabbos HojamberdievInstitut für Chemie, Technische Universität Berlin, Straße des 17. Juni 135, 10623 Berlin, GermanyRonald VargasInstituto Tecnológico de Chascomús (INTECH), Universidad Nacional de San Martín (UNSAM) – Consejo Nacional de Investigaciones Científicas y Técnicas (CONICET), Av. Intendente Marino, Km 8.2, CC 164 (B7130IWA), Chascomús, ArgentinaVijendra Singh BhatiDepartment of Electrical Engineering, Indian Institute of Technology Jodhpur, Jodhpur 342037, IndiaDaniel TorresDepartment of Chemistry, Simón Bolívar University, Apartado 89000, Caracas 1080A, VenezuelaZukhra C. KadirovaDepartment of Inorganic Chemistry, Faculty of Chemistry, National University of Uzbekistan, University Street 4, 100174 Tashkent, UzbekistanMahesh KumarDepartment of Electrical Engineering, Indian Institute of Technology Jodhpur, Jodhpur 342037, India
ABI
Аннотация
Аннотация мавжуд эмас.