X-Ray Peak Profile Analysis of Silica by Williamson–Hall and Size-Strain Plot Methods
Budi HariyantoDepartment of Physics, Faculty of Mathematics and Natural Science, Universitas Palangka Raya, Palangka Raya 73111, IndonesiaDyah Ayu Pramoda WardaniDepartment of Chemistry, Faculty of Mathematics and Natural Science, Universitas Palangka Raya, Palangka Raya 73111, IndonesiaNeny KurniawatiDepartment of Physics, Faculty of Mathematics and Natural Science, Universitas Palangka Raya, Palangka Raya 73111, IndonesiaNazopatul Patonah HarDepartment of Physics, Faculty of Mathematics and Natural Sciences, IPB University, Bogor 16680, IndonesiaNoviyan DarmawanDepartment of Chemistry, Faculty of Mathematics and Natural Sciences, IPB University, Bogor 16680, IndonesiaIrzaman IrzamanDepartment of Physics, Faculty of Mathematics and Natural Sciences, IPB University, Bogor 16680, Indonesia
2021en
ABI
Аннотация
Abstract Annealed silica has been prepared by various annealing temperatures at 800 °C and 1000 °C. The crystallite size and lattice strain of silica were estimated by x-ray diffraction spectra analysis using various calculation methods; Modified Scherrer, Williamson-Hall (W-H), and Size-Strain Plot. Qualitative analysis confirms that the XRD patterns were hexagonal quartz. Annealing temperature cause a change in crystal size and lattice strain and all methods showed a decrease in the value of the crystal size with increasing annealing temperature from 800 °C to 1000 °C.
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