Nanoscale mechanisms of CNT growth and etching in plasma environment
Umedjon KhalilovDepartment of Chemistry, Research group PLASMANT, University of Antwerp, Universiteitsplein 1, 2610 Wilrijk, Antwerp, BelgiumAnnemie BogaertsDepartment of Chemistry, Research group PLASMANT, University of Antwerp, Universiteitsplein 1, 2610 Wilrijk, Antwerp, BelgiumShahzad HussainUniversité d’Orléans, GREMI UMR 7344 CNRS, 45067 Orléans Cedex 2, FranceEva KovačevićUniversité d’Orléans, GREMI UMR 7344 CNRS, 45067 Orléans Cedex 2, FrancePascal BraultUniversité d’Orléans, GREMI UMR 7344 CNRS, 45067 Orléans Cedex 2, FranceChantal Boulmer-LeborgneUniversité d’Orléans, GREMI UMR 7344 CNRS, 45067 Orléans Cedex 2, FranceErik C. NeytsDepartment of Chemistry, Research group PLASMANT, University of Antwerp, Universiteitsplein 1, 2610 Wilrijk, Antwerp, Belgium
2017en
ABI
Аннотация
International audience
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