Oxygen incorporation in Ti2AlC thin films
Johanna Rosénthe University of Sydney 1 School of Physics, , New South Wales 2006, AustraliaPer O. Å. Perssonthe University of Sydney 1 School of Physics, , New South Wales 2006, AustraliaMihail IonescuANSTO 2 , Lucas Heights, New South Wales 2234, AustraliaA. Kondyurinthe University of Sydney 1 School of Physics, , New South Wales 2006, AustraliaDavid R. McKenziethe University of Sydney 1 School of Physics, , New South Wales 2006, AustraliaMarcela Bilekthe University of Sydney 1 School of Physics, , New South Wales 2006, Australia
2008en
ABI
Аннотация
Thin films of Ti2AlC MAX phase have been deposited using a multiple cathode pulsed cathodic arc. Evidence for substantial oxygen incorporation in the MAX phase is presented, likely originating from residual gas present in the vacuum chamber during deposition. The characteristic MAX phase crystal structure is maintained, in agreement with ab initio calculations, supporting substitutional O in C lattice positions. On the basis of these results, we propose the existence of a MAX phase-like material with material properties tuned by the incorporation of oxygen. Additionally, possible unintentional O incorporation in previously reported MAX phase materials is suggested.
Ҳали таржима қилинмаган
Идентификаторлар
Иқтибослар ва манбалар
2 та иқтибос0 та фойдаланилган манба