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Ушбу иш иқтибос қилган ишлар

11 та иш

Иш: Procedure for determining defects in sputtered clusters of ionic crystals

  1. Kinetics of aggregations of F 2, F 3, X, and colloid centers in LiF/Si(111) films upon low-temperature annealing

    Utkirjon Sharopov, Б.Г. Атабаев, R. Djabberganov +1

    МақолаElectron and X-Ray Spectroscopy TechniquesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201311 иқтибос
    ABI

  2. Mechanism for the formation of molecular clusters under ion sputtering

    Н. Х. Джемилев

    МақолаIon-surface interactions and analysisJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques20127 иқтибос
    ABI

  3. The mechanisms of sputtering part I.

    Roger Kelly

    Мақола19844 иқтибос
    ABI

  4. Electron stimulated desorption of neutral species from (100) KCl surfaces

    Marek Szymoński, A. Poradzisz, P. Czuba +5

    Мақола19923 иқтибос
    ABI

  5. On the mechanism of cluster emission in sputtering

    K. Wittmaack

    Мақола19793 иқтибос
    ABI

  6. Potential Sputtering of Lithium Fluoride by Slow Multicharged Ions

    T. Neidhart, Franz Pichler, F. Aumayr +3

    Мақола19952 иқтибос
    ABI

  7. Positive-ion production by electron bombardment of alkali halides

    R. E. Walkup, Phaedon Avouris, Aryya Ghosh

    Мақола19872 иқтибос
    ABI

  8. Defect mediated sputtering of amorphous LiF induced by low-energy ion bombardment

    N. Seifert, Qun Yan, A. V. Barnes +5

    Мақола19952 иқтибос
    ABI

  9. Threshold for Potential Sputtering of LiF

    G. Hayderer, Michael Schmid, П. Варга +7

    Мақола19992 иқтибос
    ABI

  10. The role of defect diffusion and metallization for electron-stimulated desorption from CaF2

    Michael Reichling

    Мақола19952 иқтибос
    ABI

  11. Сарлавҳасиз

    Бошқа1 иқтибос
    ABI