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Иш: Defect Formation on the Surface of ZnO Using Low-Energy Electrons
Kinetics of aggregations of F 2, F 3, X, and colloid centers in LiF/Si(111) films upon low-temperature annealing
Utkirjon Sharopov, Б.Г. Атабаев, R. Djabberganov +1
МақолаElectron and X-Ray Spectroscopy TechniquesJournal of Surface Investigation X-ray Synchrotron and Neutron Techniques201311 иқтибосABIElectron beam charging of insulators with surface layer and leakage currents
N. Cornet, D. Goeuriot, C. Guerret-Piécourt +4
Мақола20084 иқтибосABIStability of ionically bonded surfaces in ionizing environments
M. L. Knotek, Peter J. Feibelman
Мақола19792 иқтибосABI