New high-Tc benchmarks for organic and fullerene superconductors
Jack M. WilliamsChemistry and Materials Science Divisions, Argonne National Laboratory, Argonne, IL 60439,USAH.H. WangChemistry and Materials Science Divisions, Argonne National Laboratory, Argonne, IL 60439,USAK. Douglas CarlsonChemistry and Materials Science Divisions, Argonne National Laboratory, Argonne, IL 60439,USAA. M. KiniChemistry and Materials Science Divisions, Argonne National Laboratory, Argonne, IL 60439,USAU. GeiserChemistry and Materials Science Divisions, Argonne National Laboratory, Argonne, IL 60439,USAArthur J. SchultzChemistry and Materials Science Divisions, Argonne National Laboratory, Argonne, IL 60439,USAW. K. KwokChemistry and Materials Science Divisions, Argonne National Laboratory, Argonne, IL 60439,USAU. WelpChemistry and Materials Science Divisions, Argonne National Laboratory, Argonne, IL 60439,USAG. W. CrabtreeChemistry and Materials Science Divisions, Argonne National Laboratory, Argonne, IL 60439,USAS. FleshlerChemistry and Materials Science Divisions, Argonne National Laboratory, Argonne, IL 60439,USAM.-H. WhangbooDepartment of Chemistry, North Carolina State University, Raleigh, NC 27695, USAJ. E. SchirberSandia National Laboratories, Albuquerque, NM 87185, USA
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