Ушбу иш иқтибос қилган ишлар

2 та иш

Иш: Formation of nanosize silicides films on the Si(111) and Si(100) surfaces by low-energy ion implantation

1. Electronic properties of semiconducting silicides: fundamentals and recent predictions

   L. Ivanenko, В. Л. Шапошников, А. Б. Филонов +6

   Мақола20046 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.199255

2. Structure determination of the Si(111):B(√3×√3)<i>R</i>30° surface: Subsurface substitutional doping

   Randall L. Headrick, Ian Robinson, Elias Vlieg +1

   Мақола19892 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.362841