Сrystallinity and size control of silicon nanoparticles synthesized from monosilane in glow-discharge plasma
Р. Х. АшуровArifov Institute of Ion–Plasma and Laser Technologies, Tashkent, 100125, UzbekistanT. K. TurdalievArifov Institute of Ion–Plasma and Laser Technologies, Tashkent, 100125, UzbekistanI. Kh. AshurovArifov Institute of Ion–Plasma and Laser Technologies, Tashkent, 100125, UzbekistanV. M. RotshteynArifov Institute of Ion–Plasma and Laser Technologies, Tashkent, 100125, Uzbekistan
ABI
Аннотация
Decomposition reaction of monosilane in glow discharge plasma of both direct (DC) and alternating current (AC) have been performed. The possibility of nanosilicon synthesis using the glow discharge plasma has been shown. The Raman spectroscopy is applied to study the phase composition and granulometric analysis of the obtained nanosilicon samples. The possibility of the structure and size control of amorphous silicon films with nano crystalline inclusions (a-Si:H/c-Si + nc-Si) by varying pressure and composition of a gas mixture in the process of synthesis has been demonstrated.
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