A comparison of the oxidation behavior of CrN films deposited using continuous dc, pulsed dc and modulated pulsed power magnetron sputtering
Jianliang LinAdvanced Coatings and Surface Engineering Laboratory (ACSEL), Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO, 80401, USANingyi ZhangAdvanced Coatings and Surface Engineering Laboratory (ACSEL), Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO, 80401, USAWilliam D. SproulAdvanced Coatings and Surface Engineering Laboratory (ACSEL), Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO, 80401, USAJohn J. MooreAdvanced Coatings and Surface Engineering Laboratory (ACSEL), Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, CO, 80401, USA
2012en
ABI
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