Post-deposition annealing of thin RF magnetron sputter-deposited VO2 films above the melting point
Sergey S. MaklakovК. И. МаслаковInstitute for Theoretical and Applied Electromagnetics RAS, 125412, Moscow, 13 Izhorskaya St., RussiaVictor I. PolozovInstitute for Theoretical and Applied Electromagnetics RAS, 125412, Moscow, 13 Izhorskaya St., RussiaSergey A. MaklakovSergey A. MaklakovAlexey D. MishinInstitute for Theoretical and Applied Electromagnetics RAS, 125412, Moscow, 13 Izhorskaya St., RussiaIlya A. RyzhikovAlexander L. TrigubNational Research Centre “Kurchatov Institute”, Moscow, 1 Akademika Kurchatova pl., RussiaV. A. AmelichevV. N. Kisel
2018en
ABI
Аннотация
Аннотация мавжуд эмас.
Идентификаторлар
Иқтибослар ва манбалар
2 та иқтибос0 та фойдаланилган манба