Ушбу ишга иқтибос қилган ишлар

2 та иш

Иш: Modification of Diazoquinone–Novolac Photoresist Films beyond the Region of Implantation of B+ Ions

1. INDENTATION OF NEGATIVE PHOTORESIST FILMS FOR LIFT-OFF LITHOGRAPHY

   С. А. Вабищевич, Д. И. Бринкевич, В. С. Просолович +4

   МақолаMetal and Thin Film MechanicsHERALD OF POLOTSK STATE UNIVERSITY Series С FUNDAMENTAL SCIENCES20250 иқтибос

   ABIABI:AkademIndex/openalex/2025.article.001632

2. FILMS OF THE NEGATIVE PHOTORESIST AZ nLOF 5510,IRRADIATED BY ELECTRONS

   S. V. Abramov, Д. И. Бринкевич, В. С. Просолович +5

   МақолаPolymer Synthesis and CharacterizationHERALD OF POLOTSK STATE UNIVERSITY Series С FUNDAMENTAL SCIENCES20250 иқтибос

   ABIABI:AkademIndex/openalex/2025.article.001986