Ушбу ишга иқтибос қилган ишлар

2 та иш

Иш: The impact of deposition and annealing temperature on the growth properties and surface passivation of silicon dioxide films obtained by atomic layer deposition

1. Controlling the Low-temperature Ionic Purification of a Silicon Surface by Electron Spectroscopy

   U. B. Sharopov, Kulwinder Kaur, М. К. Курбанов +3

   МақолаIon-surface interactions and analysisSilicon202111 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.144468

2. Controlling the Low-Temperature Ionic Purification of a Silicon Surface by Electron Spectroscopy

   U. B. Sharopov, Kulwinder Kaur, М. К. Курбанов +3

   ПрепринтSemiconductor materials and devicesResearch Square20211 иқтибос

   ABIABI:AkademIndex/openalex/2026.other.365538