Doubling the critical temperature of La1.9Sr0.1CuO4 using epitaxial strain
Jean‐Pierre LocquetIBM Research Division, Zurich Research Laboratory, CH-8803, Rüschlikon, SwitzerlandJ. PerretIBM Research Division, Zurich Research Laboratory, CH-8803, Rüschlikon, SwitzerlandJ. FompeyrineIBM Research Division, Zurich Research Laboratory, CH-8803, Rüschlikon, SwitzerlandE. MächlerIBM Research Division, Zurich Research Laboratory, CH-8803, Rüschlikon, SwitzerlandJin Won SeoIBM Research Division, Zurich Research Laboratory, CH-8803, Rüschlikon, SwitzerlandGustaaf Van TendelooEMAT, RUCA, University of Antwerp, B-2020, Antwerpen, Belgium
1998en
ABI
Аннотация
Аннотация мавжуд эмас.
Идентификаторлар
Иқтибослар ва манбалар
7 та иқтибос0 та фойдаланилган манба