Ушбу ишга иқтибос қилган ишлар

2 та иш

Иш: Influence of Cr+ ion implantation and pulsed ion-beam annealing on the formation and optical properties of Si/CrSi2/Si(111) heterostructures

1. Raman and IR Spectrum Analysis of CrSi2 Thin Films Formed in Direct Current and Variable Frequency Modes of a Magnetron Sputtering Device

   K.T. Dovranov, Maksim Vinnichenko, V.V. Korablev +3

   МақолаChalcogenide Semiconductor Thin Films20242 иқтибос

   ABIABI:AkademIndex/openalex/2024.article.003101

2. Electrophysical Properties of Nanofilms Produced by Magnetron Sputtering Method

   Dovranov Kuvondik Turakulovich

   БобSemiconductor materials and devicesIntechOpen eBooks20240 иқтибос

   ABIABI:AkademIndex/openalex/2024.chapter.000421