Ушбу ишга иқтибос қилган ишлар

2 та иш

Иш: Electrical Resistance Measurements on Hydrogen‐Charged Tantalum and Niobium

1. Effect of impurities on the residual resistance of niobium

   Β. N. Aleksandrov, G. P. Kovtun, V. A. Elenskiǐ

   МақолаMetal and Thin Film MechanicsSoviet Journal of Low Temperature Physics19790 иқтибос

   ABIABI:AkademIndex/openalex/1979.article.000069

2. Influence of the type of impurity on the scattering of conduction electrons in niobium and vanadium at 20.4 °K

   Β. N. Aleksandrov, Н. В. Далакова, М. И. Слободской +1

   МақолаAdvanced Chemical Physics StudiesSoviet Journal of Low Temperature Physics19810 иқтибос

   ABIABI:AkademIndex/openalex/1981.article.000158