Alma‐Asta Kiisler

1 ta ish

Material (Belgium)

1. Atomic Layer Chemical Vapor Deposition of TiO[sub 2] Low Temperature Epitaxy of Rutile and Anatase

   Mikael Schuisky, Anders Hårsta, Aleks Aidla +3

   Maqola20002 iqtibos

   ABIABI:AkademIndex/2026.other.433659