J. Ratajczak

1 ta ish

Institute of Electron Technology

1. Deep-ultraviolet Raman investigation of silicon oxide: thin film on silicon substrate versus bulk material

   Paweł Borowicz, Mariusz Latek, W. Rzodkiewicz +3

   Maqola20122 iqtibos

   ABIABI:AkademIndex/2026.other.258446