Ryuichiro Kamimura

1 ta ish

Ulvac (Japan)

1. Reduction of plasma-induced damage in n-type GaN by multistep-bias etching in inductively coupled plasma reactive ion etching

   Shinji Yamada, Masato Omori, Hideki Sakurai +5

   Maqola20192 iqtibos

   ABIABI:AkademIndex/2026.other.418079