Chen Techao

1 ta ish

Department of Science and Technology of Hunan Province

1. Effects of process parameters and chamber structure on plasma uniformity in a large-area capacitively coupled discharge

   Jicheng Zhou, Jia Liao, Jing Huang +3

   Maqola20212 iqtibos

   ABIABI:AkademIndex/2026.other.418086