Hongbo Li

1 ta ish

East China University of Science and Technology

1. The impact of deposition and annealing temperature on the growth properties and surface passivation of silicon dioxide films obtained by atomic layer deposition

   Jiahui Xu, Shizheng Li, Wenjing Zhang +5

   Maqola20212 iqtibos

   ABIABI:AkademIndex/2026.other.492997