Naoki Kawazoe

1 ta ish

National Institute for Materials Science

1. Development of ag/Ag2O/BiPO4/Bi2WO6/g-C3N4 Z-scheme photocatalyst for high-efficiency tetracycline removal: Characterization, degradation pathway and toxicity assessments

   Hongjian Zhang, Qiansu Ma, Guangqi An +5

   Maqola20253 iqtibos

   ABIABI:AkademIndex/2026.other.328829