V. A. Terekhov

1 ta ish

Solid State Department, Voronezh State University, 394693 Voronezh, Russia

1. Defect formation and crystallization in a-Si:H induced by Si+ implantation

   O. A. Golikova, E. V. Bogdanova, Alexey N. Kuznetsov∥ +4

   MaqolaThin-Film Transistor TechnologiesJournal of Non-Crystalline Solids20020 iqtibos

   ABIABI:AkademIndex/openalex/2002.article.000285