P. Konarskii

1 ta ish

Tele and Radio Research Institute, Warsaw, Poland

1. Effect of deposition parameters on the superhardness and stoichiometry of nanostructured Ti–Hf–Si–N films

   A. D. Pogrebnyak, В. М. Береснев, A. P. Shpak +9

   MaqolaMetal and Thin Film MechanicsRussian Physics Journal20121 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.495543