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Features of the resistive state of thin aluminum films

V. M. SvistunovDonetsk Physicotechnical Institute, Academy of Sciences of the Ukrainian SSRMikhail BelogolovskiiDonetsk Physicotechnical Institute, Academy of Sciences of the Ukrainian SSRV. Yu. TarenkovDonetsk Physicotechnical Institute, Academy of Sciences of the Ukrainian SSRV. V. StupakovDonetsk Physicotechnical Institute, Academy of Sciences of the Ukrainian SSRE. D. NemchenkoDonetsk Physicotechnical Institute, Academy of Sciences of the Ukrainian SSR

Soviet Journal of Low Temperature Physicsjournal1978en

Ochiq kirish: yoʻq

ABI

Annotatsiya

The features of the current-voltage characteristics of thin aluminum films with tungsten oxide impurities have been investigated experimentally. The effect of microwave radiation on the dynamic conductivity of these specimens has been studied.

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Mavzular

Metallurgical and Alloy Processes Copper Interconnects and Reliability Thermodynamic and Structural Properties of Metals and Alloys

Identifikatorlar

DOI: 10.1063/10.0029641

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