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Polycrystalline silicon S-diode fabricated using phosphorus thermal diffusion along grain boundaries

R. AlievInstitute of Electronics, Academgorodok, 700143, Tashkent, UzbekistanB. M. AbdurakhmanovInstitute of Electronics, Academgorodok, 700143, Tashkent, UzbekistanR. BilyalovInstitute of Electronics, Academgorodok, 700143, Tashkent, Uzbekistan
Interface Sciencejournal1997en

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