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Cross linking and thermal destruction processes in thin films formed from dilute solutions of a copolymer of trifluorochloroethylene and vinylidene fluoride

A. O. PozdnyakovInstitute of Problems in Mechanical Engineering, Russian Academy of Sciences, St. PetersburgБ. М. ГинзбургInstitute of Problems in Mechanical Engineering, Russian Academy of Sciences, St. PetersburgO. F. PozdnyakovInstitute of Problems in Mechanical Engineering, Russian Academy of Sciences, St. PetersburgB. P. RedkovA. F. Ioffe Physicotechnical Institute, Russian Academy of Sciences, St. Petersburg
Technical Physics Lettersjournal1998en

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Thermal desorption mass spectrometry has been used to investigate the mechanisms for thermal destruction of films prepared from dilute solutions of a copolymer of trifluorochloroethylene and vinylidene fluoride. It is shown that compared with films obtained from concentrated solutions, the ratio of the intensities of the low-and high-temperature stages of HCl and HF release changes substantially in this case. It is concluded that the low-temperature stage of hydrogen halide release is attributable to cross-linking processes rather than to intramolecular reactions caused by the formation of double bonds in the chain.

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