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Ish: New Tight-Binding Method for Simulation of Defect Configurations, Creation and Diffusion Mechanisms in Solids: Application to Silicon

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  2. Simplified LCAO Method for the Periodic Potential Problem

    J. C. Slater, G. F. Koster

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  3. (110) surface atomic structures of covalent and ionic semiconductors

    D. J. Chadi

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    ABI
  4. Negative-U Properties for Point Defects in Silicon

    G. D. Watkins, John R. Troxell

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  5. Transferable tight-binding models for silicon

    I. Kwon, R. Biswas, C. Z. Wang +2

    Maqola19944 iqtibos
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  6. A new mechanism for interstistitial migration

    J. C. Bourgoin, J. W. Corbett

    Maqola19724 iqtibos
    ABI
  7. Computer Modelling of Electronic and Atomic Processes in Solids

    Kitob19972 iqtibos
    ABI
  8. DEFECTS IN AMORPHOUS Si:H — THE REHYBRIDIZED TWO-SITE (RTS) MODEL

    David Redfield

    Maqola19912 iqtibos
    ABI