Creation of microrelief on frontal surface of SC structures using selective coatings
Р. А. Муминовthe Academy of Sciences of the Republic of UzbekistanМ. Н. Турсуновthe Academy of Sciences of the Republic of UzbekistanU. B. AbdievPhysicotechnical Institute, NPO Fizika-Solntse, the Academy of Sciences of the Republic of Uzbekistan, Tashkent, UzbekistanZ. S. Settarovathe Academy of Sciences of the Republic of Uzbekistan
Ochiq kirish: yoʻq
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A new technique of creating photosensitive structures on semiconductor materials is proposed. The morphology of the surface of the diffusion layers is considered. The creation of microrelief on the frontal surface of photosensitive structures is described.
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