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Printable photonic crystals with high refractive index for applications in visible light

Giuseppe C. CalafiorePolytechnic University of TurinQuentin FillotThe Molecular Foundry, LBNL, One Cyclotron Road, Berkeley, CA 94702,Scott DhueyThe Molecular Foundry, LBNL, One Cyclotron Road, Berkeley, CA 94702,Simone SassoliniThe Molecular Foundry, LBNL, One Cyclotron Road, Berkeley, CA 94702, USAFilippo SalvadoriThe Molecular Foundry, LBNL, One Cyclotron Road, Berkeley, CA 94702, USACamilo A. MejíaaBeam Technologies, 22290 Foothill Blvd. St2, Hayward, CA 94541,Keiko MunechikaaBeam Technologies, 22290 Foothill Blvd. St2, Hayward, CA 94541,Christophe PérozaBeam Technologies, 22290 Foothill Blvd. St2, Hayward, CA 94541,Stefano CabriniThe Molecular Foundry, LBNL, One Cyclotron Road, Berkeley, CA 94702,Carlos Piña-HernandezaBeam Technologies, 22290 Foothill Blvd. St2, Hayward, CA 94541,

2016en

Ochiq kirishBronza

ABI

Annotatsiya

Nanoimprint lithography (NIL) of functional high-refractive index materials has proved to be a powerful candidate for the inexpensive manufacturing of high-resolution photonic devices. In this paper, we demonstrate the fabrication of printable photonic crystals (PhCs) with high refractive index working in the visible wavelengths. The PhCs are replicated on a titanium dioxide-based high-refractive index hybrid material by reverse NIL with almost zero shrinkage and high-fidelity reproducibility between mold and printed devices. The optical responses of the imprinted PhCs compare very well with those fabricated by conventional nanofabrication methods. This study opens the road for a low-cost manufacturing of PhCs and other nanophotonic devices for applications in visible light.

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DOI: 10.1088/0957-4484/27/11/115303

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