Ushbu ish iqtibos qilgan ishlar

1 ta ish

Ish: STUDY OF THE DISTRIBUTION PROFILE OF ION- IMPLANTED IN SILICON AND INFLUENCE THERMAL ANNEALING ON THE STRUCTYRE OF IRON SILICIDES

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   Mark C. Biesinger, Brad P. Payne, Andrew P. Grosvenor +3

   Maqola201012 iqtibos

   ABIABI:AkademIndex/2026.other.026454