Assessment of the Thickness of the Anti-Reflective Film of a Solar Cell by Color
V. G. DyskinTashkent State Technical University, 100095, Tashkent, UzbekistanI. A. YuldoshevTashkent State Technical University, 100095, Tashkent, UzbekistanU. B. KhamdamovTashkent State Technical University, 100095, Tashkent, Uzbekistan
Ochiq kirish: yoʻq
ABI
Annotatsiya
A method for estimating film thickness based on the color painting of the non-absorbing film-absorbing substrate system is proposed. The method can be useful for developing the technology of applying anti-reflective coatings to solar cells. The thickness of a dark blue anti-reflective SiO film applied to a silicon wafer was determined to illustrate the method.
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