Thermal Diffusion of Copper into Chromium Disilicide
М. S. LukasovA.V. Shubnikov Institute of CrystallographyF. Yu. SolomkinPhysicotechnical InstituteН. В. ШаренковаPhysicotechnical InstituteS. V. NovikovPhysicotechnical InstituteV. V. KlechkovskayaShubnikov Institute of Crystallography of the Kurchatov Complex Crystallography and Photonics of the NRC “Kurchatov Institute”, Moscow, Russia
2026en
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The microstructure, elemental and phase composition of the interface zone between chromium disilicide and copper were studied on three samples: when copper was chemically deposited on CrSi2 and when samples were obtained by fusing single-crystal and briquetted CrSi2 into copper.
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