Post-deposition annealing of thin RF magnetron sputter-deposited VO2 films above the melting point
Sergey S. MaklakovК. И. МаслаковInstitute for Theoretical and Applied Electromagnetics RAS, 125412, Moscow, 13 Izhorskaya St., RussiaVictor I. PolozovInstitute for Theoretical and Applied Electromagnetics RAS, 125412, Moscow, 13 Izhorskaya St., RussiaSergey A. MaklakovSergey A. MaklakovAlexey D. MishinInstitute for Theoretical and Applied Electromagnetics RAS, 125412, Moscow, 13 Izhorskaya St., RussiaIlya A. RyzhikovAlexander L. TrigubLomonosov Moscow State University, Chemistry Department, 119991, Moscow, Leninskie Gory 1-3, RussiaV. A. AmelichevV. N. Kisel
2018en
ABI
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