Sputtering of silicon by atomic and cluster bismuth ions: An influence of projectile nuclearity and specific kinetic energy on the sputter yield
A. TolstogouzovSchool of Physics and Technology, Wuhan University, 430072, Wuhan, ChinaPaul MazarovRaith GmbH, 44263, Dortmund, GermanyA.E. IeshkinPhysical Department, Lomonosov Moscow State University, 119991, Moscow, Russian FederationS.F. BelykhMoscow Aviation Institute (National Research University), 125993, Moscow, Russian FederationN. G. KorobeishchikovDepartment of Applied Physics, Novosibirsk State University, 630090, Novosibirsk, Russian FederationVasiliy PelenovichSchool of Power and Mechanical Engineering, Wuhan University, 430072, Wuhan, ChinaDejun FuSchool of Physics and Technology, Wuhan University, 430072, Wuhan, China
2021en
ABI
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