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Doubling the critical temperature of La1.9Sr0.1CuO4 using epitaxial strain

Jean‐Pierre LocquetIBM Research Division, Zurich Research Laboratory, CH-8803, Rüschlikon, SwitzerlandJ. PerretInstitut de Physique, Université de Neuchâtel, CH-2000, Neuchâtel, SwitzerlandJ. FompeyrineIBM Research Division, Zurich Research Laboratory, CH-8803, Rüschlikon, SwitzerlandE. MächlerIBM Research Division, Zurich Research Laboratory, CH-8803, Rüschlikon, SwitzerlandJin Won SeoIBM Research Division, Zurich Research Laboratory, CH-8803, Rüschlikon, SwitzerlandGustaaf Van TendelooEMAT, RUCA, University of Antwerp, B-2020, Antwerpen, Belgium

1998en

ABI

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DOI: 10.1038/28810

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