Maqola

Study of the composition of the barrier layer and various mechanisms of adsorption of molecules in tunnel contacts on aluminum base

O. I. ShklyarevskiǐPhysicotechnical Institute of Low Temperatures, Academy of Sciences of the Ukrainian SSRA. A. LysykhPhysicotechnical Institute of Low Temperatures, Academy of Sciences of the Ukrainian SSRI. K. YansonPhysicotechnical Institute of Low Temperatures, Academy of Sciences of the Ukrainian SSR

Soviet Journal of Low Temperature Physicsjournal1978en

ABI

Annotatsiya

A study has been made of tunnel contacts with an aluminum base electrode. Plasma oxidation of aluminum films at temperatures up to 250° C has been shown to result in the formation of an aluminum hydroxide barrier layer. The nature of the adsorption centers on the surface of the thin oxide films on aluminum has been determined. Qualitative analysis of the intensity of bands in the tunnel spectrum of symmetric molecules indicates a change in the symmetry of the molecules, apparently occurring under the effect of the internal field of the junction.

Mavzular

Molecular Junctions and Nanostructures Force Microscopy Techniques and Applications Surface and Thin Film Phenomena

Identifikatorlar

DOI: 10.1063/10.0029791

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