Growth Morphology and Structure Peculiarities of Superthin Titanium Films
I. F. MikhailovKharkov Politechnical Institute, 21 Frunze Street, Kharkov-310002, UkrainaS. S. BorisovaKharkov Politechnical Institute, 21 Frunze Street, Kharkov-310002, UkrainaL. P. FominaKharkov Politechnical Institute, 21 Frunze Street, Kharkov-310002, UkrainaI. N. BabenkoKharkov Politechnical Institute, 21 Frunze Street, Kharkov-310002, UkrainaN. N. MelnikP. N. Lebedev Physical Institute, Russian Academy of Sciences, 53 Leninsky Prospect, Moscow-117942, RussiaF. A. PudoninP. N. Lebedev Physical Institute, Russian Academy of Sciences, 53 Leninsky Prospect, Moscow-117942, Russia
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Abstract Superthin titanium films of 0.3 to 2 nm thickness, prepared by radio‐frequency sputtering, have been studied by modern X‐ray methods, such as reflectometry, fluorescent analysis and grasing‐beam structural analysis. Two simple models were used to describe early stages of film growth. It has been shown that the thinnest titanium films were the TiO 2 islands with an equal height. Thicker films could be described as bilayers Ti/TiO 2 . The films became continuous already near 1.5 nm effective thickness.
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