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Ish: The kinetics of low-temperature electron-phonon relaxation in a metallic film following instantaneous heating of the electrons
Nonequilibrium in metallic microstructures in the presence of high current density
Gerd Bergmann, Wei Wei, Yao Zou +1
Maqola19907 iqtibosABITransparency of a<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">YBa</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math><mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">Cu</mml:mi></mml:mrow><mml:mrow><mml:mn>3</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math><mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">O</mml:mi></mml:mrow><mml:mrow><mml:mn>7</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>-film/substrate interface for thermal phonons measured by means of voltage response to radiation
Andrei Sergeev, A. Semenov, P. Kouminov +5
Maqola19942 iqtibosABI