Ushbu ish iqtibos qilgan ishlar

7 ta ish

Ish: Effect of anodic etching of heavily doped silicon on the location of the plasma minimum

1. Determination of Optical Constants and Carrier Effective Mass of Semiconductors

   W. G. Spitzer, Heng Fan

   Maqola19572 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.404966

2. Resistivity of Bulk Silicon and of Diffused Layers in Silicon

   J.C. Irvin

   Maqola19622 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.518120

3. Chemically etched porous silicon as an anti-reflection coating for high efficiency solar cells

   L. Schirone, Giovanni Sotgiu, F. Califano

   Maqola19972 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.666799

4. Sarlavhasiz

   Boshqa1 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.666798

5. Sarlavhasiz

   Boshqa1 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.666800

6. Sarlavhasiz

   Boshqa1 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.666801

7. Sarlavhasiz

   Boshqa1 iqtibos

   ABIABI:AkademIndex/openalex/2026.other.666802