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19 ta ish
Ish: Study of doping uniformity of a 200 kV ion implanter by RBS and sheet resistance measurements
Simulated annealing analysis of Rutherford backscattering data
N.P. Barradas, C. Jeynes, R.P. Webb
Maqola19975 iqtibosABIFundamentals of surface and thin film analysis
L. C. Feldman, James W. Mayer, F. Adams
Maqola19892 iqtibosABI