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Effect of Implantation of Ba+ Ions on the Composition, Electronic and Crystal Structure of W(111) and WO2 Surfaces

Б. Е. УмирзаковTashkent State Technical University, 100095, Tashkent, UzbekistanД. А. ТашмухамедоваTashkent State Technical University, 100095, Tashkent, UzbekistanF. Ya. KhudaykulovTashkent State Technical University, 100095, Tashkent, Uzbekistan
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It is shown that upon the implantation of Ba+ ions in W, a mechanical mixture of [Ba + W] atoms is formed in the surface layer. At an ion energy of E0 = 0.5 keV, the thickness of this layer is ~25–30 Å. Due to a decrease in the work function and an increase in the atomic density of ion-implanted layers, the maximum coefficient of secondary-electron emission σmax and the photoelectron quantum yield Y increase significantly. When the [Ba + W] system is heated to T = 900 K, the formation of a chemical bond between Ba and W atoms is not observed. In the case of the implantation of Ba+ ions in WO2, compounds of the W–O, Ba–O, and Ba–O–W types are formed in the surface layer. In this case, the growth of σm and Y is explained only by a decrease in the work function of the surface.

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