← Ishga qaytish
Ushbu ish iqtibos qilgan ishlar
33 ta ish
Ish: Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode
Mahsulotlar
Ishlab chiquvchilar uchun
AkademBaseEkotizim uchun ochiq API33 ta ish
Ish: Enhancing plasma uniformity in SiH4/NH3 capacitively coupled plasmas via dielectric structure adjustment positioning adjacent to the power electrode