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Ish: Comparative research fluorine and colloidal aggregate formation on the surface lithium fluoride thin films during electronic, ionic and thermal treatments
The reaction of fluorine atoms with silicon
Daniel Flamm, Vincent M. Donnelly, J. A. Mucha
Maqola19812 iqtibosABILithium diffusion profile onto highly resistive p-type silicon
A. Keffous, Toufik Hadjersi, A. Cheriet +6
Maqola20062 iqtibosABI