Deposition of Ti–B–N films by ICP assisted sputtering
Dooyoung JungSchool of Materials Science and Engineering, College of Engineering, Seoul National University, 131-404, San 56-1, Shillim-dong, Seoul 151-744, South KoreaH. KimSchool of Materials Science and Engineering, College of Engineering, Seoul National University, 131-404, San 56-1, Shillim-dong, Seoul 151-744, South KoreaG.R. LeeSchool of Materials Science and Engineering, College of Engineering, Seoul National University, 131-404, San 56-1, Shillim-dong, Seoul 151-744, South KoreaBumsoo ParkSchool of Materials Science and Engineering, College of Engineering, Seoul National University, 131-404, San 56-1, Shillim-dong, Seoul 151-744, South KoreaJ.J. LeeSchool of Materials Science and Engineering, College of Engineering, Seoul National University, 131-404, San 56-1, Shillim-dong, Seoul 151-744, South KoreaJaewon JooDepartment of Material Science and Engineering, Kunsan National University, Mt. 68 Miryong dong, Kunsan 573-701, South Korea
2003en
ABI
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